Chemical mechanical planarization (CMP) slurries are liquid dispersions containing active chemicals and microabrasive grains used for chemical mechanical planarization. CMP is a surface polishing and ...
Chemical Mechanical Planarization is a process of smoothing wafer surface through exerting the chemical and mechanical polishing on wafer. It is an important step in IC fabrication process. To achieve ...
With this reputation, they are now leading projects with Micron. CAMP’s main projects include Chemical Mechanical Planarization and environmental sustainbility of chip manufacturing.
The Semiconductor Systems segment includes semiconductor capital equipment for etch, rapid thermal processing, deposition, chemical mechanical planarization, metrology and inspection, wafer ...
The company has developed and patented a surface modification technology rooted in chemical mechanical planarization (CMP), a process used in advanced semiconductor chip manufacturing. Planatome ...
from nano pattern delineation to bulk wafer planarization. These substrate holders are designed and manufactured exclusively by AJA and offer numerous desirable features such as cooling ...